Atomically Flat SiO2/Si(001) Interface Formation by UHV Annealing.
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: SHINKU
سال: 1994
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.37.903